Depot Institutionnel de l'UMBB >
Publications Scientifiques >
Publications Internationales >
Veuillez utiliser cette adresse pour citer ce document :
http://dlibrary.univ-boumerdes.dz:8080/handle/123456789/14333
|
Titre: | Electrochemical Deposition of Hematite α-Fe2O3 Thin Films for Photo-Current Generation Application |
Auteur(s): | Mokhtari, S. Bouhdjer, Lazhar Dokhan, Nahed Aoudjit, Lamine Imma, H. Omeiri, Said Trari, Mohamed |
Mots-clés: | Hematite α-Fe2O3 Iron anodization Microstructural analysis Nanostructured thin films Photoelectrochemistry |
Date de publication: | 2024 |
Editeur: | Pleiades Publishing |
Collection/Numéro: | Russian Journal of Physical Chemistry A/ Vol. 98, N° 9(2024);pp. 2171 - 2178 |
Résumé: | In the field of sustainable hydrogen production, hematite (α-Fe2O3) is a promising material owing to its optical band gap and water oxidation/reduction energies. In this context, the main objective of this work is devoted to the synthesis of α-Fe2O3 by electrochemical anodization of iron sheet using two anodization voltages (20 and 30 V), followed by annealing at 450°C (1.5 h) in air. Indeed, annealing is a necessary but not sufficient condition for the hematite prepared electrochemically. Furthermore, we discuss the effect of anodizing voltage and analyze its influence on the properties of the films namely structural, morphological, optical, electrochemical and photoelectrochemical (PEC) properties. The annealed Fe2O3 sample, anodized at 30 V, demonstrates a net photocurrent density of 0.81 mA/cm2 at 0.744 VRHE in KOH (1 M). The obtained results indicate that the α-hematite thin films synthesized by anodization technique under optimized conditions is a promising photoanode in PEC cells. |
URI/URL: | https://link.springer.com/article/10.1134/S0036024424701309 https://doi.org/10.1134/S0036024424701309 http://dlibrary.univ-boumerdes.dz:8080/handle/123456789/14333 |
ISSN: | 0036-0244 |
Collection(s) : | Publications Internationales
|
Fichier(s) constituant ce document :
Il n'y a pas de fichiers associés à ce document.
|
Tous les documents dans DSpace sont protégés par copyright, avec tous droits réservés.
|